Toimittaja: Oxford Instruments Nanotechnology Tools Ltd, trading as Oxford Instruments Plasma Technology
Yksi arkistoitu hankinta
Viimeaikaiset hankinnat, joissa toimittaja on mainittu Oxford Instruments Nanotechnology Tools Ltd, trading as Oxford Instruments Plasma Technology
2020-05-11
Inductively Coupled Plasma Reactive Ion Etch Tool/ICP-RIE System (University of Jyväskylä)
An inductively-coupled-plasma reactive-ion-etcher (ICP-RIE), capable of flexible etching of different materials. Whole system with all required components. Capable of handling wafers up to 200 mm in diameter. There must be a loadlock and (semi)automatic loading of single-wafers and small chips between loadlock and process chamber. The substrate electrode temperature should be controllable between at least -150 C and 300 C. Contracting authority (JYU) may suspend the procurement procedure if the tenders … Näytä hankinnat »
An inductively-coupled-plasma reactive-ion-etcher (ICP-RIE), capable of flexible etching of different materials. Whole system with all required components. Capable of handling wafers up to 200 mm in diameter. There must be a loadlock and (semi)automatic loading of single-wafers and small chips between loadlock and process chamber. The substrate electrode temperature should be controllable between at least -150 C and 300 C. Contracting authority (JYU) may suspend the procurement procedure if the tenders … Näytä hankinnat »