Toimittaja: Oxford Instruments Nanotechnology Tools Ltd, trading as Oxford Instruments Plasma Technology

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Viimeaikaiset hankinnat, joissa toimittaja on mainittu Oxford Instruments Nanotechnology Tools Ltd, trading as Oxford Instruments Plasma Technology

2020-05-11 Inductively Coupled Plasma Reactive Ion Etch Tool/ICP-RIE System (University of Jyväskylä)
An inductively-coupled-plasma reactive-ion-etcher (ICP-RIE), capable of flexible etching of different materials. Whole system with all required components. Capable of handling wafers up to 200 mm in diameter. There must be a loadlock and (semi)automatic loading of single-wafers and small chips between loadlock and process chamber. The substrate electrode temperature should be controllable between at least -150 C and 300 C. Contracting authority (JYU) may suspend the procurement procedure if the tenders … Näytä hankinnat »
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