Toimittaja: Oxford Instruments Plasma Technology
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Viimeaikaiset hankinnat, joissa toimittaja on mainittu Oxford Instruments Plasma Technology
2013-12-04
PECVD deposition system, Reg. No: 434/060/2013 (VTT Technical Research Centre of Finland)
The object of the tender is a Plasma Enhanced Chemical Vapour Deposition (PECVD) system for 150 and 200 mm wafers, with an automatic cassette-to-cassette loading system. The main processes the equipment will be used for are deposition of silicon oxide and silicon nitride. The equipment must be compatible with standard IC- and MEMS- device processing. The process specifications of the equipment to be supplied are defined in more detail in the invitation to tender, Annex 5. The PECVD System will be โฆ Nรคytรค hankinnat ยป
The object of the tender is a Plasma Enhanced Chemical Vapour Deposition (PECVD) system for 150 and 200 mm wafers, with an automatic cassette-to-cassette loading system. The main processes the equipment will be used for are deposition of silicon oxide and silicon nitride. The equipment must be compatible with standard IC- and MEMS- device processing. The process specifications of the equipment to be supplied are defined in more detail in the invitation to tender, Annex 5. The PECVD System will be โฆ Nรคytรค hankinnat ยป