PECVD deposition system, Reg. No: 434/060/2013
The object of the tender is a Plasma Enhanced Chemical Vapour Deposition (PECVD) system for 150 and 200 mm wafers, with an automatic cassette-to-cassette loading system. The main processes the equipment will be used for are deposition of silicon oxide and silicon nitride. The equipment must be compatible with standard IC- and MEMS- device processing.
The process specifications of the equipment to be supplied are defined in more detail in the invitation to tender, Annex 5.
The PECVD System will be installed in the Micronova Nanofabrication Centre cleanroom, jointly used by VTT and Aalto University for research, development and small-volume production of MEMS- and nanoelectronic devices and materials. The cleanroom classification is ISO4…ISO 6 (10…1000). The total area of the cleanroom is 2 600 m2 and there is an installed equipment base of 200 processing and measurement tools.
Määräaika
Tarjousten vastaanottamisen määräaika oli 2014-01-20.
Hankinta julkaistiin 2013-12-04.
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Hankintojen historia
| Päivämäärä |
Asiakirja |
| 2013-12-04
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hankintailmoitus
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| 2014-06-30
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Ilmoitus tehdystä sopimuksesta
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