Toimittaja: MueTec GmbH

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2017-04-12   CD Measurement Tool (VTT Technical Research Centre of Finland Ltd)
The purpose of the equipment is to measure critical dimensions (CD) and alignment accuracy (Overlay) of the photolithography-patterned features on silicon wafers or other similar substrates. The Equipment must be capable to handle SEMI standard based wafers with multilayer thin film structures such as oxide, nitride, metals and photoresist. The procurement is described in detail in the invitation to tender documents. Näytä hankinnat »
Mainitut toimittajat: MueTec GmbH
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