Aalto University School of Electrical Engineering and School of Chemical Engineering are seeking a complete turn-key, stand-alone deep reactive ion etcher to be used in silicon etching. The equipment should be capable of running both close to room-temperature Bosch processes and cryo-processes without hardware changes in the equipment. The equipment should be capable of adjusting plasma power over wide range enabling high etch rate silicon etch processes, low damage shallow etching and black silicon etching. The DRIE equipment will be installed into an ISO 5 class cleanroom and should be fully compatible with the requirements of such environment.
Please, see attached documents for more detailed requirements for the object of the contract.
Määräaika
Tarjousten vastaanottamisen määräaika oli 2020-06-11.
Hankinta julkaistiin 2020-05-12.
Kohde Hankinnan laajuus
Otsikko:
“Inductively-coupled Plasma Reactive-ion Etching (ICP-RIE) Device
D/256/01.01.04.00/2020”
Tuotteet/palvelut: Kuivaetsauslaitteet📦
Lyhyt kuvaus:
“Aalto University School of Electrical Engineering and School of Chemical Engineering are seeking a complete turn-key, stand-alone deep reactive ion etcher...”
Lyhyt kuvaus
Aalto University School of Electrical Engineering and School of Chemical Engineering are seeking a complete turn-key, stand-alone deep reactive ion etcher to be used in silicon etching. The equipment should be capable of running both close to room-temperature Bosch processes and cryo-processes without hardware changes in the equipment. The equipment should be capable of adjusting plasma power over wide range enabling high etch rate silicon etch processes, low damage shallow etching and black silicon etching. The DRIE equipment will be installed into an ISO 5 class cleanroom and should be fully compatible with the requirements of such environment.
Please, see attached documents for more detailed requirements for the object of the contract.
1️⃣
Suorituspaikka: Helsinki-Uusimaa🏙️
Hankinnan kuvaus:
“Aalto University School of Electrical Engineering and School of Chemical Engineering are seeking a complete turn-key, stand-alone deep reactive ion etcher...”
Hankinnan kuvaus
Aalto University School of Electrical Engineering and School of Chemical Engineering are seeking a complete turn-key, stand-alone deep reactive ion etcher to be used in silicon etching. The equipment should be capable of running both close to room-temperature Bosch processes and cryo-processes without hardware changes in the equipment. The equipment should be capable of adjusting plasma power over wide range enabling high etch rate silicon etch processes, low damage shallow etching and black silicon etching. The DRIE equipment will be installed into an ISO 5 class cleanroom and should be fully compatible with the requirements of such environment.
Please, see attached documents for more detailed requirements for the object of the contract.
Näytä lisää Myöntämisperusteet
Hinta
Sopimuksen, puitesopimuksen tai dynaamisen hankintajärjestelmän kesto
Jäljempänä oleva aikataulu on ilmaistu kuukausina.
Kuvaus
Kesto: 6
Menettely Toimenpiteen tyyppi
Avoin menettely
Hallinnolliset tiedot
Tarjousten tai osallistumishakemusten vastaanottamisen määräaika: 2020-06-11
12:00 📅
Kielet, joilla tarjoukset tai osallistumishakemukset voidaan jättää: englanti 🗣️
Jäljempänä oleva aikataulu on ilmaistu kuukausina.
Vähimmäisaika, jonka kuluessa tarjoajan on pidettävä tarjous voimassa: 3
Tarjousten avaamista koskevat ehdot: 2020-06-11
12:01 📅
Täydentävät tiedot Arvostelurunko
Nimi: The Market Court
Postiosoite: Radanrakentajantie 5
Postitoimipaikka: Helsinki
Postinumero: 00520
Maa: Suomi 🇫🇮
Puhelin: +358 295643300📞
Sähköposti: markkinaoikeus@oikeus.fi📧
URL: http://www.oikeus.fi/markkinaoikeus🌏
Lähde: OJS 2020/S 093-221701 (2020-05-12)