Vacuum Cluster Connecting an ALD Reactor to Surface Analytical Instrument

University of Helsinki/Chemistry Department

The instrument will be acquired for Chemistry Department, University of Helsinki. The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier. The offer may cover:
(i) the whole instrument;
(ii) the ALD reactor only; or
(iii) the UHV cluster with the analytical instruments. When offering only 1 part, the supplier needs to prepare ensuring proper interfacing between the ALD loadlock and the UHV loadlock to ensure a complete working system. Final designs for the interfacing are to be done at the negotiation phase of the procurement.

Määräaika

Tarjousten vastaanottamisen määräaika oli 2020-01-15. Hankinta julkaistiin 2019-12-12.

Toimittajat

Seuraavat toimittajat mainitaan hankintapäätöksissä tai muissa hankinta-asiakirjoissa:

• Beneq Oy
• Prevac sp. z o.o.

Kuka?

• University of Helsinki/Chemistry Department

Mitä?

• Laboratoriolaitteet, optiset ja tarkkuuslaitteet (lukuun ottamatta silmälaseja)

Missä?

• Manner-Suomi › Helsinki-Uusimaa

Hankintojen historia

Päivämäärä	Asiakirja
2019-12-12	hankintailmoitus
2020-06-22	Ilmoitus tehdystä sopimuksesta

hankintailmoitus (2019-12-12)
Kohde
Hankinnan laajuus
Otsikko: Laboratoriolaitteet, optiset ja tarkkuuslaitteet (lukuun ottamatta silmälaseja)
Lyhyt kuvaus:

The instrument will be acquired for Chemistry Department, University of Helsinki. The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier. The offer may cover: (i) the whole instrument; (ii) the ALD reactor only; or (iii) the UHV cluster with the analytical instruments. When offering only 1 part, the supplier needs to prepare ensuring proper interfacing between the ALD loadlock and the UHV loadlock to ensure a complete working system. Final designs for the interfacing are to be done at the negotiation phase of the procurement.

Ilmoituksen metatiedot
Alkukieli: englanti 🗣️
Asiakirjatyyppi: hankintailmoitus
Sopimuksen luonne: Tavarat
Asetus: Euroopan unioni ja WTO-maat
Yhteinen hankintanimikkeistö (CPV)
Koodi: Laboratoriolaitteet, optiset ja tarkkuuslaitteet (lukuun ottamatta silmälaseja) 📦
Lisä-CPV-koodi: Laboratoriolaitteet, optiset ja tarkkuuslaitteet (lukuun ottamatta silmälaseja) 📦
Suorituspaikka
NUTS-alue: Helsinki-Uusimaa 🏙️

Menettely
Menettelyn tyyppi: Kilpailullinen neuvottelumenettely
Tarjouksen tyyppi: Tarjous koskee kaikkia eriä
Myöntämisperusteet
Kokonaistaloudellisesti edullisin tarjous

Hankintaviranomainen
Tunnistetiedot
Maa: Suomi 🇫🇮
Hankintaviranomaisen tyyppi: Muu
Hankintaviranomaisen nimi: University of Helsinki/Chemistry Department
Postiosoite: Yliopistonkatu 3
Postinumero: 00014
Postitoimipaikka: Helsinki
Yhteystiedot
Internetosoite: https://www.helsinki.fi/fi 🌏
Sähköposti: hankinnat@helsinki.fi 📧
Asiakirjojen URL-osoite: https://hanki.tarjouspalvelu.fi/hanki?id=263285&tpk=1fd3fe72-0748-4658-90dc-ef95246638a4 🌏
Osallistumisen URL-osoite: https://hanki.tarjouspalvelu.fi/hanki?id=263285&tpk=1fd3fe72-0748-4658-90dc-ef95246638a4 🌏

Viite
Päivämäärät
Lähetyspäivä: 2019-12-12 📅
Tarjousten jättämisen määräaika: 2020-01-15 📅
Julkaisupäivä: 2019-12-16 📅
Tunnisteet
Ilmoituksen numero: 2019/S 242-594292
EUVL-S-numero: 242

Kohde
Hankinnan laajuus
Lyhyt kuvaus:

(i) the whole instrument;

(ii) the ALD reactor only; or

(iii) the UHV cluster with the analytical instruments. When offering only 1 part, the supplier needs to prepare ensuring proper interfacing between the ALD loadlock and the UHV loadlock to ensure a complete working system. Final designs for the interfacing are to be done at the negotiation phase of the procurement.

Osan nimi: ALD Reactor
Osan numero: 1
Lyhyt kuvaus:

The ALD reactor must be of a hot wall flow type reactor with a loadlock. Besides its normal operation, the loadlock must allow connection to the UHV cluster so that samples can be transferred to the UHV loadlock and further to the UHV cluster and analytical chambers. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier. The reactor should have at least 2 solid (heated) sources, 2 liquid (non-heated) sources and at least 1 gas inlet. The reaction chamber must have an operation temperature of at least 450 ºC. The reactor must be compatible with metal halides and other common ALD precursors (exceptions should be mentioned). The substrate size must be 100 mm wafers in minimum. The reactor must have windows for connecting an ellipsometer (FilmSense, already owned by the buyer) on a loadlock in minimum, but if possible directly to the chamber. Plasma source must be offered as an option. Ozone generator can be offered as an option. QCM and/or QMS can also be offered as options, but their proper operation for representative reaction mechanism studies need to be demonstrated. Also other options like FTIR can be offered.

Kesto: 12 kuukautta
Vaihtoehtojen kuvaus:

2 solid (heated) sources, 2 liquid (non-heated) sources, at least 1 gas inlet will be acquired. Additional sources as options. Plasma source must be offered as an option. Ozone generator can be offered as an option. QCM, QMS and/or FTIR can be offered as options, proper operation for representative reaction mechanism studies need to be demonstrated.

Osan nimi: UHV Cluster and Surface Analytical Instruments
Osan numero: 2
Lyhyt kuvaus:

UHV cluster must contain at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) instruments in separate chambers, optionally also a FTIR chamber. There must also be a distribution chamber(s) and system for transferring the samples between the analysis chambers and loadlocks. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier from which they are picked for further transfer in the UHV cluster. One should also be able to return from the UHV side to the ALD reactor. There must also be a loadlock for a direct introduction of samples to the UHV cluster. XPS must be optimised for measuring chemical shifts: resolution and high count rate are emphasised. Sample holder should allow heating the sample up to at least 700 ºC. Ion beam gun for depth profiling and flood source for neutralising positive charging samples are also needed. Accessories to the XPS chamber should be offered; these may contain, but are not limited to, imaging XPS, ARXPS, ARPES, UPS, ISS, AES, EELS, LEED. TPD should have in minimum a mass spectrometer up to 300 amu and a port for gas inlet.

Vaihtoehtojen kuvaus:

FTIR as a separate chamber can be offered as an option. Optional accessories to XPS chamber may contain, but are not limited to, imaging XPS, ARXPS, ARPES, UPS, ISS, AES, EELS, LEED. Properly sized UPS for uninterrupted power supply for at least 1 h backup as an option. Sample holders included and options for additional holders. Optional warranty years.

Menettely
Oikeusperusta: 32014L0024
Tarjousten vastaanottoaika: 12:00
Kielet, joilla tarjoukset tai osallistumishakemukset voidaan jättää: englanti 🗣️
Tarjouksen voimassaoloaika: 3 kuukautta

Hankintaviranomainen
Tunnistetiedot
Kansallinen rekisterinumero: 0313471-7
Muu hankintaviranomaisen tyyppi: University
Yhteystiedot
Asiakirjojen URL-osoite: https://hanki.tarjouspalvelu.fi/hanki?id=263285&tpk=1fd3fe72-0748-4658-90dc-ef95246638a4 🌏

Täydentävät tiedot
Arvostelurunko
Nimi: Markkinaoikeus
Postiosoite: Radanrakentajantie 5
Postitoimipaikka: Helsinki
Postinumero: 00520
Maa: Suomi 🇫🇮
Puhelin: +358 295643300 📞
Sähköposti: markkinaoikeus@oikeus.fi 📧
Faksi: +358 295643314 📠
Internetosoite: http://www.oikeus.fi/markkinaoikeus 🌏
Lähde: OJS 2019/S 242-594292 (2019-12-12)

Ilmoitus tehdystä sopimuksesta (2020-06-22)
Kohde
Hankinnan laajuus
Lyhyt kuvaus:

Vacuum cluster connecting an ALD reactor to surface analytical instrument for Chemistry department, University of Helsinki. The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier.

Hankinnan kokonaisarvo: 1 176 960 EUR 💰
Ilmoituksen metatiedot
Asiakirjatyyppi: Ilmoitus tehdystä sopimuksesta

Menettely
Menettelyn tyyppi: Rajoitettu menettely
Tarjouksen tyyppi: Ei sovelleta

Viite
Päivämäärät
Lähetyspäivä: 2020-06-22 📅
Julkaisupäivä: 2020-06-25 📅
Tunnisteet
Ilmoituksen numero: 2020/S 121-295087
Viittaa ilmoitukseen: 2019/S 242-594292
EUVL-S-numero: 121

Kohde
Hankinnan laajuus
Lyhyt kuvaus:

Vacuum cluster connecting an ALD reactor to surface analytical instrument for Chemistry department, University of Helsinki.

The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier.

The reactor should have at least 2 solid (heated) sources, 2 liquid (non-heated) sources, and at least one gas inlet. The reaction chamber must have an operation temperature of at least 450°C. The reactor must be compatible with metal halides and other common ALD precursors (exceptions should be mentioned). The substrate size must be 100 mm wafers in minimum.

The reactor must have windows for connecting an ellipsometer (FilmSense, already owned by the buyer) on a loadlock in minimum, but if possible directly to the chamber.

Plasma source must be offered as an option. Ozone generator can be offered as an option.

QCM and/or QMS can also be offered as options, but their proper operation for representative reaction mechanism studies need to be demonstrated. Also other options like FTIR can be offered.

Vaihtoehtojen kuvaus:

2 solid (heated) sources, 2 liquid (non-heated) sources, at least one gas inlet will be acquired. Additional sources as options.

Plasma source must be offered as an option.

Ozone generator can be offered as an option.

QCM, QMS and/or FTIR can be offered as options, proper operation for representative reaction mechanism studies need to be demonstrated.

Lyhyt kuvaus:

XPS must be optimised for measuring chemical shifts: resolution and high count rate are emphasised. Sample holder should allow heating the sample up to at least 700°C. Ion beam gun for depth profiling and flood source for neutralising positive charging samples are also needed. Accessories to the XPS chamber should be offered; these may contain, but are not limited to, imaging XPS, ARXPS, ARPES, UPS, ISS, AES, EELS, LEED.

TPD should have in minimum a mass spectrometer up to 300 amu and a port for gas inlet.

Vaihtoehtojen kuvaus:

FTIR as a separate chamber can be offered as an option.

Optional accessories to XPS chamber may contain, but are not limited to, imaging XPS, ARXPS, ARPES, UPS, ISS, AES, EELS, LEED.

Properly sized UPS for uninterrupted power supply for at least 1 h backup as an option.

Sample holders included and options for additional holders.

Optional warranty years.

Menettely
Myöntämisperusteet
Laatukriteeri (nimi): Quality
Laatukriteeri (painotus): 45
Hinta (painotus): 55
Laatukriteeri (painotus): 40
Hinta (painotus): 60

Sopimuksen tekeminen
Sopimuksen tekemispäivä: 2020-06-10 📅
Nimi: Beneq Oy
Kansallinen rekisterinumero: FI19563372
Postiosoite: Olarinluoma 9
Postitoimipaikka: Espoo
Postinumero: 02200
Maa: Suomi 🇫🇮
Puhelin: +358 447097412 📞
Sähköposti: kari.koski@beneq.com 📧
Maa: Helsinki-Uusimaa 🏙️
Hankinnan kokonaisarvo: 382 100 EUR 💰
Sopimuksen tekemispäivä: 2020-05-29 📅
Nimi: PREVAC sp. z o.o.
Kansallinen rekisterinumero: PL6471782175
Postiosoite: ul. Raciborska 61
Postitoimipaikka: Rogów
Postinumero: 44362
Maa: Puola 🇵🇱
Puhelin: +48 324592000 📞
Sähköposti: tenders@prevac.pl 📧
Hankinnan kokonaisarvo: 794 860 EUR 💰
Tietoa tarjouskilpailuista
Saatujen tarjousten määrä: 2
1
Lähde: OJS 2020/S 121-295087 (2020-06-22)

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