The instrument will be acquired for Chemistry Department, University of Helsinki. The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier. The offer may cover:
(i) the whole instrument;
(ii) the ALD reactor only; or
(iii) the UHV cluster with the analytical instruments. When offering only 1 part, the supplier needs to prepare ensuring proper interfacing between the ALD loadlock and the UHV loadlock to ensure a complete working system. Final designs for the interfacing are to be done at the negotiation phase of the procurement.
Määräaika
Tarjousten vastaanottamisen määräaika oli 2020-01-15.
Hankinta julkaistiin 2019-12-12.
Toimittajat
Seuraavat toimittajat mainitaan hankintapäätöksissä tai muissa hankinta-asiakirjoissa:
Kohde Hankinnan laajuus
Otsikko: Vacuum Cluster Connecting an ALD Reactor to Surface Analytical Instrument
Tuotteet/palvelut: Laboratoriolaitteet, optiset ja tarkkuuslaitteet (lukuun ottamatta silmälaseja)📦
Lyhyt kuvaus:
“The instrument will be acquired for Chemistry Department, University of Helsinki. The aim is to study atomic layer deposition (and etching) process...”
Lyhyt kuvaus
The instrument will be acquired for Chemistry Department, University of Helsinki. The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier. The offer may cover:
(i) the whole instrument;
(ii) the ALD reactor only; or
(iii) the UHV cluster with the analytical instruments. When offering only 1 part, the supplier needs to prepare ensuring proper interfacing between the ALD loadlock and the UHV loadlock to ensure a complete working system. Final designs for the interfacing are to be done at the negotiation phase of the procurement.
Näytä lisää Tietoa eristä
Tarjouksia voidaan jättää kaikista eristä
1️⃣ Hankinnan laajuus
Otsikko: ALD Reactor
Otsikko
Erän tunnistenumero: 1
Kuvaus
Lisätuotteet/palvelut: Laboratoriolaitteet, optiset ja tarkkuuslaitteet (lukuun ottamatta silmälaseja)📦
Suorituspaikka: Helsinki-Uusimaa🏙️
Hankinnan kuvaus:
“The ALD reactor must be of a hot wall flow type reactor with a loadlock. Besides its normal operation, the loadlock must allow connection to the UHV cluster...”
Hankinnan kuvaus
The ALD reactor must be of a hot wall flow type reactor with a loadlock. Besides its normal operation, the loadlock must allow connection to the UHV cluster so that samples can be transferred to the UHV loadlock and further to the UHV cluster and analytical chambers. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier. The reactor should have at least 2 solid (heated) sources, 2 liquid (non-heated) sources and at least 1 gas inlet. The reaction chamber must have an operation temperature of at least 450 ºC. The reactor must be compatible with metal halides and other common ALD precursors (exceptions should be mentioned). The substrate size must be 100 mm wafers in minimum. The reactor must have windows for connecting an ellipsometer (FilmSense, already owned by the buyer) on a loadlock in minimum, but if possible directly to the chamber. Plasma source must be offered as an option. Ozone generator can be offered as an option. QCM and/or QMS can also be offered as options, but their proper operation for representative reaction mechanism studies need to be demonstrated. Also other options like FTIR can be offered.
Näytä lisää Myöntämisperusteet
Hinta ei ole ainoa myöntämisperuste, ja kaikki perusteet ilmoitetaan ainoastaan hankinta-asiakirjoissa
Sopimuksen, puitesopimuksen tai dynaamisen hankintajärjestelmän kesto
Jäljempänä oleva aikataulu on ilmaistu kuukausina.
Kuvaus
Kesto: 12
Tietoa vaihtoehdoista
Vaihtoehdot ✅
Vaihtoehtojen kuvaus:
“2 solid (heated) sources, 2 liquid (non-heated) sources, at least 1 gas inlet will be acquired. Additional sources as options. Plasma source must be offered...”
Vaihtoehtojen kuvaus
2 solid (heated) sources, 2 liquid (non-heated) sources, at least 1 gas inlet will be acquired. Additional sources as options. Plasma source must be offered as an option. Ozone generator can be offered as an option. QCM, QMS and/or FTIR can be offered as options, proper operation for representative reaction mechanism studies need to be demonstrated.
2️⃣ Hankinnan laajuus
Otsikko: UHV Cluster and Surface Analytical Instruments
Otsikko
Erän tunnistenumero: 2
Kuvaus
Hankinnan kuvaus:
“UHV cluster must contain at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) instruments in separate chambers,...”
Hankinnan kuvaus
UHV cluster must contain at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) instruments in separate chambers, optionally also a FTIR chamber. There must also be a distribution chamber(s) and system for transferring the samples between the analysis chambers and loadlocks. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier from which they are picked for further transfer in the UHV cluster. One should also be able to return from the UHV side to the ALD reactor. There must also be a loadlock for a direct introduction of samples to the UHV cluster. XPS must be optimised for measuring chemical shifts: resolution and high count rate are emphasised. Sample holder should allow heating the sample up to at least 700 ºC. Ion beam gun for depth profiling and flood source for neutralising positive charging samples are also needed. Accessories to the XPS chamber should be offered; these may contain, but are not limited to, imaging XPS, ARXPS, ARPES, UPS, ISS, AES, EELS, LEED. TPD should have in minimum a mass spectrometer up to 300 amu and a port for gas inlet.
Näytä lisää Tietoa vaihtoehdoista
Vaihtoehtojen kuvaus:
“FTIR as a separate chamber can be offered as an option. Optional accessories to XPS chamber may contain, but are not limited to, imaging XPS, ARXPS, ARPES,...”
Vaihtoehtojen kuvaus
FTIR as a separate chamber can be offered as an option. Optional accessories to XPS chamber may contain, but are not limited to, imaging XPS, ARXPS, ARPES, UPS, ISS, AES, EELS, LEED. Properly sized UPS for uninterrupted power supply for at least 1 h backup as an option. Sample holders included and options for additional holders. Optional warranty years.
Menettely Toimenpiteen tyyppi
Kilpailullinen vuoropuhelu
Hallinnolliset tiedot
Tarjousten tai osallistumishakemusten vastaanottamisen määräaika: 2020-01-15
12:00 📅
Kielet, joilla tarjoukset tai osallistumishakemukset voidaan jättää: englanti 🗣️
Jäljempänä oleva aikataulu on ilmaistu kuukausina.
Vähimmäisaika, jonka kuluessa tarjoajan on pidettävä tarjous voimassa: 3
Täydentävät tiedot Tietoa sähköisistä työnkuluista
Sähköistä tilaamista käytetään
Sähköinen laskutus hyväksytään
Sähköistä maksua käytetään
Arvostelurunko
Nimi: Markkinaoikeus
Postiosoite: Radanrakentajantie 5
Postitoimipaikka: Helsinki
Postinumero: 00520
Maa: Suomi 🇫🇮
Puhelin: +358 295643300📞
Sähköposti: markkinaoikeus@oikeus.fi📧
Faksi: +358 295643314 📠
URL: http://www.oikeus.fi/markkinaoikeus🌏
Lähde: OJS 2019/S 242-594292 (2019-12-12)
Ilmoitus tehdystä sopimuksesta (2020-06-22) Kohde Hankinnan laajuus
Lyhyt kuvaus:
“Vacuum cluster connecting an ALD reactor to surface analytical instrument for Chemistry department, University of Helsinki.
The aim is to study atomic layer...”
Lyhyt kuvaus
Vacuum cluster connecting an ALD reactor to surface analytical instrument for Chemistry department, University of Helsinki.
The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier.
Näytä lisää
Hankinnan kokonaisarvo (ilman arvonlisäveroa): EUR 1 176 960 💰
Tietoa eristä
Tämä sopimus on jaettu osiin ✅ Kuvaus
Hankinnan kuvaus:
“The ALD reactor must be of a hot wall flow type reactor with a loadlock. Besides its normal operation, the loadlock must allow connection to the UHV cluster...”
Hankinnan kuvaus
The ALD reactor must be of a hot wall flow type reactor with a loadlock. Besides its normal operation, the loadlock must allow connection to the UHV cluster so that samples can be transferred to the UHV loadlock and further to the UHV cluster and analytical chambers. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier.
The reactor should have at least 2 solid (heated) sources, 2 liquid (non-heated) sources, and at least one gas inlet. The reaction chamber must have an operation temperature of at least 450°C. The reactor must be compatible with metal halides and other common ALD precursors (exceptions should be mentioned). The substrate size must be 100 mm wafers in minimum.
The reactor must have windows for connecting an ellipsometer (FilmSense, already owned by the buyer) on a loadlock in minimum, but if possible directly to the chamber.
Plasma source must be offered as an option. Ozone generator can be offered as an option.
QCM and/or QMS can also be offered as options, but their proper operation for representative reaction mechanism studies need to be demonstrated. Also other options like FTIR can be offered.
Näytä lisää Myöntämisperusteet
Laatukriteeri (nimi): Quality
Laatukriteeri (painotus): 45
Hinta (painotus): 55
Tietoa vaihtoehdoista
Vaihtoehtojen kuvaus:
“2 solid (heated) sources, 2 liquid (non-heated) sources, at least one gas inlet will be acquired. Additional sources as options.
Plasma source must be...”
Vaihtoehtojen kuvaus
2 solid (heated) sources, 2 liquid (non-heated) sources, at least one gas inlet will be acquired. Additional sources as options.
Plasma source must be offered as an option.
Ozone generator can be offered as an option.
QCM, QMS and/or FTIR can be offered as options, proper operation for representative reaction mechanism studies need to be demonstrated.
Näytä lisää Kuvaus
Hankinnan kuvaus:
“UHV cluster must contain at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) instruments in separate chambers,...”
Hankinnan kuvaus
UHV cluster must contain at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) instruments in separate chambers, optionally also a FTIR chamber. There must also be a distribution chamber(s) and system for transferring the samples between the analysis chambers and loadlocks. Samples are not full wafers but smaller pieces which in the ALD reactor are placed on a wafer size carrier from which they are picked for further transfer in the UHV cluster. One should also be able to return from the UHV side to the ALD reactor. There must also be a loadlock for a direct introduction of samples to the UHV cluster.
XPS must be optimised for measuring chemical shifts: resolution and high count rate are emphasised. Sample holder should allow heating the sample up to at least 700°C. Ion beam gun for depth profiling and flood source for neutralising positive charging samples are also needed. Accessories to the XPS chamber should be offered; these may contain, but are not limited to, imaging XPS, ARXPS, ARPES, UPS, ISS, AES, EELS, LEED.
TPD should have in minimum a mass spectrometer up to 300 amu and a port for gas inlet.
Näytä lisää Myöntämisperusteet
Laatukriteeri (painotus): 40
Hinta (painotus): 60
Tietoa vaihtoehdoista
Vaihtoehtojen kuvaus:
“FTIR as a separate chamber can be offered as an option.
Optional accessories to XPS chamber may contain, but are not limited to, imaging XPS, ARXPS, ARPES,...”
Vaihtoehtojen kuvaus
FTIR as a separate chamber can be offered as an option.
Optional accessories to XPS chamber may contain, but are not limited to, imaging XPS, ARXPS, ARPES, UPS, ISS, AES, EELS, LEED.
Properly sized UPS for uninterrupted power supply for at least 1 h backup as an option.
Sample holders included and options for additional holders.
Optional warranty years.