2019-12-12Vacuum Cluster Connecting an ALD Reactor to Surface Analytical Instrument (University of Helsinki/Chemistry Department)
The instrument will be acquired for Chemistry Department, University of Helsinki. The aim is to study atomic layer deposition (and etching) process mechanisms. The system connects an ALD reactor to a UHV cluster containing at least XPS (X-ray photoelectron spectroscopy) and TPD (temperature programmed desorption) chambers, optionally also FTIR chamber. Samples can be transferred through loadlocks from the ALD reactor to the UHV cluster and back. Samples are not full wafers but smaller pieces which in the …
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2019-04-11Integrated-Glovebox Atomic Layer Deposition System (Tampere University Foundation sr)
Tampere University Foundation sr (Tampere University, TAU) is asking for tenders of an Atomic Layer Deposition (ALD) system to be integrated into an existing MBraun nitrogen glovebox system according this call for tenders and its attachments. The ALD system will be used in fabricating thin film transistors (TFT), OFETs, photovoltaic devices, OLEDs and tunnel diodes as well as encapsulation layers.
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