Mask Aligner
The equipment being sought is primary used for photo-lithography patterning positive tone, negative tone and liquid phase resists on 100 and 150 mm silicon wafer. It needs to have mask alignment option for providing soft-, hard-, vacuum-contact and proximity exposure mode lithography processes. The tool should be easy to use and provide fast and reliable operation. The tool should also offer process flexibility as it is used for research purposes. The equipment will be installed to VTT Oulu clean-room.
Määräaika
Tarjousten vastaanottamisen määräaika oli 2016-06-03.
Hankinta julkaistiin 2016-04-15.
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Hankintojen historia
| Päivämäärä |
Asiakirja |
| 2016-04-15
|
hankintailmoitus
|
| 2016-09-15
|
Ilmoitus tehdystä sopimuksesta
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